Lithographic apparatus, device manufacturing method, and device manufactured thereby

摘要

A lithographic apparatus includes an illumination system for conditioning a projection beam of radiation including components having a first radiation component having a first wavelength and a second radiation component having a second wavelength for reproducing features patterned on a mask. The lithographic apparatus includes an illumination system having an adjustable filter for filtering said beam of radiation, arranged in use, to selectively adjust the proportion of said second radiation component in said beam. Embodiments of the apparatus provide reproduction of both isolated and dense features patterned on the mask.