发明名称 VERTICALLY STRUCTURED GAN TYPE LIGHT EMITTING DIODE DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A GaN-based LED(light emitting diode) with a vertical structure is provided to stably guarantee contact resistance of an n-type electrode by avoiding damage to an n-type GaN layer for contacting the n-type electrode. A p-type electrode(206) is formed on a structure support layer(207). A p-type GaN layer(205) is formed on the p-type electrode. An active layer(204) is formed on the p-type GaN layer. An n-type GaN layer(203) for contacting the n-type electrode is formed on the active layer. An etch stop layer(300) is formed on the n-type GaN layer for contacting the n-type electrode, exposing a part of the n-type GaN layer for contacting the n-type electrode. An n-type electrode(210) is formed on the n-type GaN layer exposed by the etch stop layer. The etch stop layer can be made of a material having a different etch ratio from that of the n-type GaN layer.
申请公布号 KR20070059280(A) 申请公布日期 2007.06.12
申请号 KR20050117958 申请日期 2005.12.06
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 BAIK, DOO GO;OH, BANG WON;CHOI, SEOK BEOM;LEE, SU YEOL
分类号 H01L33/06;H01L21/306;H01L33/10;H01L33/22;H01L33/32;H01L33/38;H01L33/42 主分类号 H01L33/06
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