NEAR-FIELD OPTICAL PROBE BASED ON SOI SUBSTRATE AND FABRICATION METHOD THEREOF

摘要

A near-field optical probe based on an SOI(Silicon On Insulator) substrate is provided to restrain the generation of impact between a tip and a sample by using an improved tip structure. A near-field optical probe includes a cantilever arm support part and a cantilever arm. The cantilever arm support part(62) is composed of a lower silicon layer(10) of an SOI substrate(18). The cantilever arm support part includes a through hole at one side of the lower silicon layer. The cantilever arm(64) is composed of a bonding oxide pattern(12) and an upper silicon pattern(16a), a silicon oxide pattern and a light transmission preventing layer. The silicon oxide pattern(26a) includes a tip(38) with an aperture(40). The light transmission preventing layer is formed on the silicon oxide pattern without filling up the aperture. The tip is formed like a cone type structure or a parabola type structure.