| 摘要 |
A reticle exchange unit for moving a reticle in a lithographic apparatus is disclosed. The surface of the reticle is protected by a pellicle attached thereto by a gas permeable pellicle frame. The reticle exchange unit includes a reticle preparation chamber, a reticle transport unit arranged to cause a plurality of exposed gas permeable parts of the pellicle frame to face an interior of the reticle preparation chamber, and a purge gas pressure and evacuating pressure supply arrangement coupled to the reticle preparation chamber and arranged to provide, alternately, a purge gas pressure and evacuating pressure that is lower than the purge gas pressure to the reticle preparation chamber when the exposed gas permeable parts of the pellicle frame are facing the interior of the reticle preparation chamber, so that gas flows through the pellicle frame, alternately, into and out of a pellicle space between the pellicle and the reticle.
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