RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS

摘要

A radiation system for generating a beam of radiation and a lithographic apparatus using the same are provided to prevent debris traveling from an EUV source from impacting a spectral filter mounted on a movable mount. A pulsed EUV(Extreme Ultraviolet) source(2) generates EUV radiation. A spectral filter(5) is mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount adapted to be moved synchronous with the pulsed EUV source. The spectral filter is mounted on a rotatable disc(6) spaced apart from the source to provide a temporal separation of EUV radiation generated from the source.