TEMPERATURE CONTROL SYSTEM OF CLEANROOM FOR SEMICONDUCTOR MANUFACTURING PROCESS

摘要

A temperature control system of a clean room for a semiconductor fabricating process is provided to uniformly spray gas supplied from fan filter units by integrally forming the fan filter units, supports and panels, thereby uniformly adjusting internal temperature of the clean room. Plural fan filter units(110) are provided on a ceiling chamber(104) of a clean room. A panel(130) is installed on a lower end of each fan filter unit to uniformly distribute gas supplied from the fan filter unit into the clean room. Plural supports(120) connect the fan filter units with the panels, and support the panels. The supports are fixed to the panels by plural fixing members(122). The fan filter units, the supports, and the panels are integrally formed.