| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce the time necessary for a step of stripping a resist film. <P>SOLUTION: A mask blank 10 comprises a substrate 12, a light shielding film 14 (thin film for a transfer pattern to be formed into a transfer pattern) formed on a main surface of the substrate 12, and a positive resist film 16 formed on the light shielding film 14 in a region excluding the substrate peripheral edge 32 along the end face of the substrate 12 in the main surface of the substrate 12. The outer peripheral portion 34 of the resist film 16 along the substrate peripheral edge 32 is exposed. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
