发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To prevent the occurrence of any dry failure by preventing the dew formation of isopropyl alcohol. SOLUTION: At least while inert gas containing isopropyl alcohol is supplied from a nozzle 35 to a chamber 11, heating is carried out by a tank temperature adjustment jacket 49 and a chamber temperature adjustment jacket 51 under the control of a control unit 77. Therefore, it is possible to prevent the dew formation of isopropyl alcohol supplied to the chamber 11 on the chamber 11 or a processing tank 1. As a result, it is possible to prevent the reduction in isopropyl alcohol density in the chamber 11, and to prevent the occurrence of the dry failure of a substrate W. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007142262(A) 申请公布日期 2007.06.07
申请号 JP20050335836 申请日期 2005.11.21
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 AIHARA TOMOAKI
分类号 H01L21/304 主分类号 H01L21/304
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