发明名称 VAPOR DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition method, by which the adhesiveness between a vapor deposition mask and a substrate can be improved when the vapor deposition mask is mounted on the substrate and vapor deposition can be performed with a good precision without infiltration of a vapor deposition material. SOLUTION: The vapor deposition mask 1 having a pattern forming area 4 where through holes 5 for vapor deposition are formed is mounted on one side of the substrate 30, at least the end part of the vapor deposition mask 1 is held, and a weight 20 is provided on the side opposite to the side where the vapor deposition mask 1 is mounted of the substrate 30 via pressing tool 50. Thereby, the adhesiveness between the vapor deposition mask 1 and the substrate 30 can be improved, and vapor deposition can be performed with a good precision. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007138256(A) 申请公布日期 2007.06.07
申请号 JP20050334172 申请日期 2005.11.18
申请人 KYUSHU HITACHI MAXELL LTD 发明人 KOBAYASHI YOSHIHIRO;TAMARU HIROHITO
分类号 C23C14/04 主分类号 C23C14/04
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