| 摘要 |
PROBLEM TO BE SOLVED: To provide a method which can be industrially satisfactorily utilized when a thin film is deposited by generating a discharge plasma by the use of a raw material gas containing a carbon source and by which the thin film having good quality can be obtained and the yield of the thin film can be remarkably enhanced. SOLUTION: When the thin film 7 is deposited on a substrate 6 by generating a discharge plasma by applying a pulse voltage to electrode 5 in an atmosphere containing the raw material gas A containing a carbon source, the continuing time of the pulse voltage is 10 to 1,000 nsec and the pressure is≤50 Torr. COPYRIGHT: (C)2007,JPO&INPIT
|
