发明名称 METHOD FOR MANUFACTURING METAL-OXIDE SEMICONDUCTOR MATERIAL FOR GAS SENSOR
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal-oxide semiconductor material for gas sensor, which can improve sensitivity in detecting a gas and keep the gas detecting sensitivity high, over a long period of time. SOLUTION: A metal salt is brought to drip in an alkaline water solution under churning, thereby preparing a water solution in which an oxide precursor is dispersed. A noble metal colloid solution is added to the water solution in which the oxide precursor is dispersed, thereby preparing a dispersion solution, in which the oxide precursor and nobel metal colloid are dispersed almost evenly. The metal-oxide semiconductor material is manufactured, by calcinating the sediment of the dispersion solution. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007139713(A) 申请公布日期 2007.06.07
申请号 JP20050337215 申请日期 2005.11.22
申请人 KYUSHU UNIV;HOKURIKU ELECTRIC IND CO LTD 发明人 MIURA NORIO;TAKEBAYASHI MASARU
分类号 G01N27/12 主分类号 G01N27/12
代理机构 代理人
主权项
地址