| 摘要 |
The invention relates to the use of double-refractive partial layers (30, 32, 36, 38, 40, 42, 44 - 47) in coatings (5, 6, 10 - 21, 30, 32, 36, 38, 40, 42, 44 - 47) on optical elements, especially for microlithography objectives. Partial layers (30, 32, 36, 38, 40, 42, 44 - 47) with a modulated thickness are used. |
