| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor integrated circuit in which a momentary current is widely suppressed and a dummy pattern does not become a noise source to the existing wiring. SOLUTION: The method for manufacturing the semiconductor integrated circuit provided with the dummy pattern for adjusting signal wirings that connect function elements onto a semiconductor substrate and the function elements to each other, each wiring including a power source/grand wiring and the wiring area rate of each wiring, includes an arrangement/wiring step S11 for determining the layout of the function elements and each wiring on the basis of function information of the semiconductor integrated circuit; a dummy pattern wiring region extracting step S12 for extending at least any wiring of the respective wirings in a width direction to form an extended wiring region and subsequently extracting an inverted region of the extended wiring region to form a part where the dummy pattern is provided; and a dummy pattern generating step S13 for generating a dummy pattern in a direction perpendicular to the wiring direction of each wiring in the dummy pattern wiring region. COPYRIGHT: (C)2007,JPO&INPIT
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