发明名称 |
APPARATUS FOR APPLYING SOLUTION AND METHOD FOR MEASURING AMOUNT OF SOLUTION TO BE SUPPLIED |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for applying a solution, in which the precision when the amount of the solution to be supplied from a nozzle is measured can be improved and the efficiency when the measuring work is done can also be improved. SOLUTION: The apparatus for applying the solution onto a substrate is provided with: a plurality of application heads 22 which are arranged along the predetermined direction and each of which has the nozzle for applying the solution onto the substrate; a placing table 7 on the upper surface of which the substrate is placed; a first linear motor 8 for relatively moving the placing table and the plurality of application heads to the direction crossing the predetermined direction; a scale 41 for measuring the weight of the solution to be supplied from the plurality of application heads; and a second linear motor 44 for moving the scale independently of the placing table to the predetermined direction or the direction crossing the predetermined direction. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007136450(A) |
申请公布日期 |
2007.06.07 |
申请号 |
JP20060277935 |
申请日期 |
2006.10.11 |
申请人 |
SHIBAURA MECHATRONICS CORP |
发明人 |
KAJIWARA SHINJI |
分类号 |
B05C11/00;B05C5/00;B05C13/02;B05D1/26;B05D3/00 |
主分类号 |
B05C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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