APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
摘要
A chamber (102 in Fig. 2) for exposing a workpiece to charged particles (101 in Fig. 2) includes a source, a collimator, a beam digitizer (230 in Fig. 2) downstream of the collimator configured to create a digital beam including groups of at least one charged particle (Fig. 3B and 5) by adjusting longitudinal spacing between the particles along the axis, a deflector (210 in Fig. 6A and 6B) downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
申请公布号
WO2007008792(A3)
申请公布日期
2007.06.07
申请号
WO2006US26725
申请日期
2006.07.10
申请人
NEXGENSEMI HOLDINGS CORPORATION;ZANI, MICHAEL JOHN;SCOTT, JEFFREY WINFIELD;BENNAHMIAS, MARK JOSEPH;MAYSE, MARK ANTHONY
发明人
ZANI, MICHAEL JOHN;SCOTT, JEFFREY WINFIELD;BENNAHMIAS, MARK JOSEPH;MAYSE, MARK ANTHONY