发明名称 APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR CHIP
摘要 <p><P>PROBLEM TO BE SOLVED: To realize an apparatus and a method of manufacturing semiconductor chips which can improve the yield of the semiconductor chips to be acquired by separating a semiconductor substrate. <P>SOLUTION: The semiconductor chip manufacturing apparatus 1 includes an adsorbing member 43 for adsorbing and holding a semiconductor chip 22c, and a transfer mechanism 44 for transferring the adsorbing member 43. When the semiconductor chip 22c is adsorbed by the adsorbing member 43 and ascended by the transferring mechanism 44, a shearing stress is generated intensively on a modifying region introduced by irradiation of a laser beam in response to a separation schedule line DL of the semiconductor chip 22c. In this way, the semiconductor substrate 21 is separated in a thickness direction along the separation schedule line DL, and the semiconductor chip 22c can be acquired. The semiconductor chip 22c is transferred by the transfer mechanism 44 in a state where it is adsorbed by the adsorbing member 43 to a mounting process for mounting it on a package. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007141998(A) 申请公布日期 2007.06.07
申请号 JP20050331215 申请日期 2005.11.16
申请人 DENSO CORP 发明人 SUGIURA KAZUHIKO;ASAI MAKOTO;FUJII TETSUO
分类号 H01L21/301;B23K26/04;B23K26/38;B23K26/42;B23K101/40 主分类号 H01L21/301
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