| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation device provided with a charged particle beam source constituted of a plurality of reduced optical systems of the charged particle beam sources, and the charged particle beam irradiation device in which the plurality of charged particle beams are reduced and overlapped on a sample face and in which one piece of spot can be formed. SOLUTION: The charged particles beam irradiation device 10 is provided with the plurality of charged particle beam sources 6 in order to generate the charged particle beams, and electron optical systems (2, 3, 4) to converge the plurality of charged particle beams B onto the sample 5, which were generated from the plurality of charged particle beam sources 6. The plurality of charged particle beams B generated from the plurality of charged particles beam 6 is constituted or set so that the charged particle beam forms one point-like beam on the sample 5. COPYRIGHT: (C)2007,JPO&INPIT
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