| 摘要 |
A method for symmetrically aligning a pattern piece (36) relative to a work material (26) defining a pattern (28) with varying repeat dimensions. The method including selectively capturing first and second images of areal portions of the work material corresponding respective first and second reference points on said pattern piece (36), displaying the first and second images adjacent one another, an moving the pattern (28) displayed in one of the first and second images an adjustment distance, such that the pattern defined by the work material (26) is substantially aligned with respect to first and second images. The position of the pattern piece (36) is then moved relative to the work material proportional to the adjustment distance so that the first and second reference points are symmetrically aligned with respect to the repeating pattern. The images can also be rotated about an axis substantially perpendicular to or parallel wit the plane of the work material (26). |
