发明名称 |
LOW RESISTIVITY COMPOUND REFRACTORY METAL SILICIDES WITH HIGH TEMPERATURE STABILITY |
摘要 |
<p>Compound refractory metal silicides are formulated to exhibit low resistivity and high temperature stability. Embodiments include various types of semiconductor devices comprising source/drain regions (15) with a compound refractory metal silicide layer (17) thereon, having a resistivity of 1 ohm.µ to 10 ohm.µ and stable at temperatures up to 1100°C.</p> |
申请公布号 |
WO2007064473(A1) |
申请公布日期 |
2007.06.07 |
申请号 |
WO2006US44293 |
申请日期 |
2006.11.15 |
申请人 |
ADVANCED MICRO DEVICES, INC.;PAN, JAMES;BROWN, DAVID |
发明人 |
PAN, JAMES;BROWN, DAVID |
分类号 |
H01L29/08;H01L29/45 |
主分类号 |
H01L29/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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