发明名称 LOW RESISTIVITY COMPOUND REFRACTORY METAL SILICIDES WITH HIGH TEMPERATURE STABILITY
摘要 <p>Compound refractory metal silicides are formulated to exhibit low resistivity and high temperature stability. Embodiments include various types of semiconductor devices comprising source/drain regions (15) with a compound refractory metal silicide layer (17) thereon, having a resistivity of 1 ohm.µ to 10 ohm.µ and stable at temperatures up to 1100°C.</p>
申请公布号 WO2007064473(A1) 申请公布日期 2007.06.07
申请号 WO2006US44293 申请日期 2006.11.15
申请人 ADVANCED MICRO DEVICES, INC.;PAN, JAMES;BROWN, DAVID 发明人 PAN, JAMES;BROWN, DAVID
分类号 H01L29/08;H01L29/45 主分类号 H01L29/08
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