| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask capable of exactly projecting respective patterns having different periods. <P>SOLUTION: The photomask includes: a substrate 10 transparent for illumination light; a low-density diffraction part 57 having a plurality of low-density extinction parts 17a, 17b, 17c, 17d which are arranged in a period of at least twice the wavelength of irradiation light on the substrate 10; and a high-density diffraction part 56 having a plurality of high-density extinction parts 16a, 16b, 16c, 16d, 16e, 16f, 16g which are arranged in a period less than twice the wavelength of irradiation light on the substrate 10 and have optical characteristics different to respective ones of the low-density extinction parts 17a, 17b, 17c, 17d. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
