| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the throughput of an exposure apparatus by increasing scanning speed in an immersion exposure apparatus. <P>SOLUTION: A liquid supply system for supplying liquid between a projection system PL and a substrate is provided with a barrier member 12 for sealing the liquid, however, the relative speed between the barrier member 12 and the substrate can be reduced, thereby to increase the speed of the substrate relative to the projection system PL by forming the barrier member 12 so that the barrier member can move relatively to the projection system PL and independently of the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
