| 摘要 |
A pattern forming material capable of being prevented from the occurrences of wrinkles and static electricity during a process of being laid on a base, and forming a very fine pattern; and a pattern forming device provided with the pattern forming material and a pattern forming method using the pattern forming material. A pattern forming material characterized by having a photosensitive layer and a protection film formed on a support in at least in this order, and 50-1000 pieces/m^2 of fish-eyes that exist in this protection film, have an area of at least 2000 mum^2, and are 1-7 mum high from the film surface; and a pattern forming device provided with the pattern forming material and a pattern forming method using the pattern forming material for exposing. |
