| 摘要 |
A wet etching apparatus is provided to prevent the generation of spot by removing waterdrop from an inner member of a chamber without an additional system using a shutter unit with a gas blow part. A wet etching apparatus includes an etching chamber(110) and a cleaning chamber(120). The wet etching apparatus further includes a chamber partition and a shutter unit. The chamber partition(155) is used for separating the etching chamber and the cleaning chamber from each other. The chamber partition includes an opening portion capable of passing a substrate. The shutter unit(160) is installed at the chamber partition to open/close the opening portion of the chamber partition. The shutter unit includes a gas blow part capable of supplying a predetermined gas.
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