MULTILAYER FILM REFLECTION MIRROR AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a multilayer film reflection mirror which hardly causes the deterioration of reflectance due to oxidation, and to provide an exposure device provided with the multilayer film reflection mirror.

SOLUTION: The multilayer film reflection mirror is provided with: an Mo/Si multilayer film 6 having a structure in which a layer principally comprising Mo and a layer principally comprising Si are alternately and periodically formed on the surface of a substrate 4; and an Ru/Si multilayer film 8 having a structure in which a layer principally comprising Ru and a layer principally comprising Si are alternately and periodically formed on the Mo/Si multilayer film.

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