DEPOSITION OF LiCoO2

摘要

In accordance with the present invention, deposition of LiCoO₂ layers in a pulsed-dc physical vapor deposition process is presented. Such a deposition can provide a low-temperature, high deposition rate deposition of a crystalline layer of LiCoO₂ with a desired (101) or (003) orientation. Some embodiments of the deposition addresses the need for high rate deposition of LiCoO₂ films, which can be utilized as the cathode layer in a solid state rechargeable Li battery. Embodiments of the process according to the present invention can eliminate the high temperature (>700° C.) anneal step that is conventionally needed to crystallize the LiCoO₂ layer. Some embodiments of the process can improve a battery utilizing the LiCoO₂ layer by utilizing a rapid thermal anneal process with short ramp rates.