| 发明名称 |
Fixed abrasive polishing pad, method of preparing the same, and chemical mechanical polishing apparatus including the same |
| 摘要 |
A fixed abrasive polishing pad includes a base and a plurality of polishing layers on the base, wherein each polishing layer includes abrasive particles and apertures in a polishing surface of the polishing layer.
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| 申请公布号 |
US2007128991(A1) |
申请公布日期 |
2007.06.07 |
| 申请号 |
US20060634195 |
申请日期 |
2006.12.06 |
| 申请人 |
YOON IL-YOUNG;SHIN HONG-JAE;LEE SE-YOUNG;CHOO JAE-OUK;KOO JA-EUNG |
发明人 |
YOON IL-YOUNG;SHIN HONG-JAE;LEE SE-YOUNG;CHOO JAE-OUK;KOO JA-EUNG |
| 分类号 |
B24B1/00;B24B29/00 |
主分类号 |
B24B1/00 |
| 代理机构 |
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代理人 |
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