| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of efficiently materializing highly precise exposure, while reducing mask fees and shortening the tact time per sheet of substrate. <P>SOLUTION: The exposure device is provided with a work stage 2 which retains a substrate W as a material to be exposed; a mask stage 1 which is disposed facing the substrate W and retains a mask M; an irradiation means 3 which irradiates the substrate W with light for pattern exposure via the mask M; and a work stage sending mechanism 2B, which performs a relative step motion between a work stage 2 and a mask stage 1 so as to face a mask pattern P of the mask M to a plurality of prescribed positions on the substrate W. The mask M is provided with small-sized masks M1 to M4, and the mask stage 1 retains a plurality of small-sized masks M1 to M4, such that the sum of effective exposure area of the plurality of small-size masks M1 to M4 becomes larger than the area of one complete pattern which is exposed and transferred to the substrate W. <P>COPYRIGHT: (C)2007,JPO&INPIT |
