| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photopolymerizable composition having good developability and excellent chemical resistance with respect to a negative photopolymerizable composition used for a scanning exposure device using a laser which emits light at about 830 nm, and a lithographic printing plate material using the same. <P>SOLUTION: The photopolymerizable composition contains a compound having a structural unit represented by formula (1) in a molecule, wherein R<SB>1</SB>and R<SB>2</SB>each represent H or an arbitrary group, and A represents a 1-4C alkylene group. <P>COPYRIGHT: (C)2007,JPO&INPIT |
