发明名称 ATMOSPHERIC-PRESSURE PLASMA GENERATION HEAD
摘要 <P>PROBLEM TO BE SOLVED: To provide an atmospheric-pressure plasma generation head capable of stably providing a highly-uniform processing region, in an atmospheric-pressure plasma head for generating a linear processing region. <P>SOLUTION: The shapes of both positive and negative electrodes 10 and 11A are each formed into a cylindrical or pipe-like form, and the positive and negative electrodes 10 and 11A are arranged in parallel with each other by perfectly fixing them. Then, the ratio of the diameter D1 of the positive electrode to the distance D2 between the surfaces of the positive and negative electrode is set between 1:0.5 and 1:3, and the negative electrodes 11A are arranged on the downstream side of the positive electrode 10 in a gas flow direction 14. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007141634(A) 申请公布日期 2007.06.07
申请号 JP20050333516 申请日期 2005.11.18
申请人 HITACHI PLANT TECHNOLOGIES LTD 发明人 KUDO TAKUJI;NUMAJIRI FUMIAKI
分类号 H05H1/24;C23C16/453;C23C16/509;C23C16/513 主分类号 H05H1/24
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