| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus operating method, and a vacuum vapor deposition apparatus capable of performing the film deposition on a long strip-like base material so that the film thickness is uniform in the longitudinal direction. SOLUTION: The film deposition work is performed on a long strip-like base material 10 experimentally in advance so that the film thickness is uniform in the longitudinal direction, and the relationship between the time and the output obtained by measuring the elapsed time from the film deposition work starting point at the experiment and the output of a power supply 51 at the time is stored in a storage unit 9. The subsequent film deposition on the long strip-like base material 10 is performed as follows. Firstly, in the preliminary heating stage before starting the film deposition work, the output of the power supply 51 is controlled so as to be consistent at a desired film deposition rate by using a crystal oscillation type film thickness meter 6. Next, after the desired film deposition rate is achieved, a base material conveying device 3 is driven to start the film deposition work on the long strip-like base material 10. After starting the film deposition work, the film deposition work is performed by controlling the output of the power supply 51 so as to be matched with the output at the elapsed time stored in the storage unit 9. COPYRIGHT: (C)2007,JPO&INPIT
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