| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus and a substrate cleaning method which can fully clean the surface of a substrate, decrease a substrate contamination due to re-adhesion of cleaning-liquid mist in drying, etc. , and have a few of risks generating a substrate breakage, etc. SOLUTION: A cleaning liquid is made to discharge from a cleaning nozzle 5 to a side 2a to be cleaned of the substrate 2, which is held on a rotary chuck 4 and rotates in a spin cup 3, and thereafter the cleaning liquid remaining on the side 2a to be cleaned is removed to be dried by air blown from an air nozzle 6, wherein a plurality of cleaning nozzles 5 is arranged so that the cleaning liquid is discharged in a spray shape on the side 2a to be cleaned and the nozzles 5 are arrayed on a straight line intersecting perpendicularly with the rotary central line of the side 2a to be cleaned. COPYRIGHT: (C)2007,JPO&INPIT
|
