发明名称 Micronozzle plate and manufacturing method
摘要 In the manufacture of at least one passage in a silicon wafer, in a first method step, starting from a first side of the wafer, a first recess is produced in the wafer, and in a second method step, starting from a second side of the wafer, a second recess is produced in the wafer. The first recess and the second recess are produced such that together they form a passage between the first and second sides of the silicon wafer.
申请公布号 US2007128755(A1) 申请公布日期 2007.06.07
申请号 US20060585769 申请日期 2006.10.23
申请人 FUERTSCH MATTHIAS;FINKBEINER STEFAN;SCHELLING CHRISTOPH;WEISS STEFAN;WAGNER THOMAS;MAEURER CHRISTIAN;BREIBACH INES 发明人 FUERTSCH MATTHIAS;FINKBEINER STEFAN;SCHELLING CHRISTOPH;WEISS STEFAN;WAGNER THOMAS;MAEURER CHRISTIAN;BREIBACH INES
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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