发明名称 Polarization evaluation mask, polarization evaluation method, and polarization determination device
摘要 A polarization evaluation mask for evaluating the state of polarization of an illumination light in exposure equipment comprises a transparent substrate; a light interceptor formed in said transparent substrate and having a plurality of fine apertures; a plurality of polarizers formed to cover said plurality of fine apertures and having orientation angles of the transmissive polarization differing in increments of certain angle; and a plurality of quarter-wave plates arranged upstream of said illumination light than said polarizers and formed as superimposed on said polarizers to cover said fine apertures, and having orientation angles of the fast axis differing in increments of certain angle. Each of said plurality of fine apertures has a different combination of said orientation angle of said polarizer and said orientation angle of said quarter-wave plate.
申请公布号 US2007127024(A1) 申请公布日期 2007.06.07
申请号 US20060605331 申请日期 2006.11.29
申请人 NOMURA HIROSHI 发明人 NOMURA HIROSHI
分类号 G01J4/00;G01J4/04;G03F1/44;H01L21/027 主分类号 G01J4/00
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