发明名称 Exposure apparatus, exposure method and device manufacturing method
摘要 An exposure apparatus that irradiates exposure light onto a substrate to expose the substrate, comprises an optical element that has a concave surface from which the exposure light is emitted, a supply port that is provided on an object that can be placed in opposition with the concave surface and that supplies a liquid to the space between the concave surface and the object, and a suction port that is provided on the object and suctions the fluid of the space between the concave surface and the object.
申请公布号 US2007127135(A1) 申请公布日期 2007.06.07
申请号 US20060589111 申请日期 2006.10.30
申请人 NIKON CORPORATION 发明人 NAGASAKA HIROYUKI
分类号 G02B3/12 主分类号 G02B3/12
代理机构 代理人
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