发明名称 METHOD AND APPARATUS FOR MONITORING A PATTERN OF AN APPLIED LIQUID
摘要 <p>A method for monitoring the quality of a pattern of fluid beads (50) applied to a moving substrate (40) measures time delays between the passage of reference points on a substrate element and leading (51) and trailing (52) edges of a bead (50), the quality of which is to be measured. Time delay ratios are generated, and compared to reference ratios. The result of the comparison is indicative of variations in the quality of the measured bead. The invention has utility in a variety of industries, including industries in which adhesive beads are applied to a substrate, such as the envelope and box industries. An apparatus in accordance with the invention may conveniently utilize non-contact sensors (9) to monitor the passage of the substrate (40) and beads (50), and further may advantageously monitor the leading (41) and trailing (42) edges of the substrate and leading (51) and trailing (52) edges of the beads (50).</p>
申请公布号 WO2007015967(A3) 申请公布日期 2007.06.07
申请号 WO2006US28427 申请日期 2006.07.20
申请人 LEVIN, LEONARD;LEVIN, SOPHIA 发明人 LEVIN, LEONARD;LEVIN, SOPHIA
分类号 B05D1/00;B05C5/00 主分类号 B05D1/00
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