| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam vacuum vapor deposition method, and its apparatus capable of performing the vapor deposition without affecting an object for film deposition, and excellent in the film deposition efficiency and uniformity of the film deposition distribution. SOLUTION: The vacuum vapor deposition method for depositing an evaporation substance accommodated in a container having an opening on an object for film deposition comprises: a heating step of heating the evaporation substance by radiating electron beams on the evaporation substance at the first position in which the opening of the container is not opposite to the object; a film deposition step of performing the film deposition on the object by moving the container to the second position opposite to the object, and emitting the evaporation substance from the opening by the remaining heat; and a position returning step of returning the container from the second position to the first position; wherein these steps are repeated in this order. COPYRIGHT: (C)2007,JPO&INPIT
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