| 摘要 |
<p>A method of detaching a resist, and resist detaching apparatus, realizing avoiding of substrate damaging, avoiding of use of chemical substances, etc, enhancing of resist detaching capability and attaining of structure simplification. Resist (11) is detached and removed by, while rotating, in a given direction, substrate (12) having resist (11) attached thereto by means of rotation mechanism (13), spraying a mixture of steam and water mist with controlled particle diameter over the resist (11) on the substrate (12) so that the water mist donated with thermal energy and kinetic energy from the steam collides with the resist (11) to thereby attain the detachment and removal thereof.</p> |
