| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of reducing particles which might be mixed (produced) into liquid, and of realizing excellent optical performance. <P>SOLUTION: The exposure apparatus comprises an illumination optical system 14 for illuminating a reticle with light from an optical source, and a projection optical system 30 for projecting a pattern of the reticle 20 to a subject to be processed. The apparatus exposes the subject to light while mediating a liquid LQ supplied between an optical element 300 disposed on the side of the projection optical system closest to the subject and the subject. Faces of the optical element through which no light passes are to be polished. <P>COPYRIGHT: (C)2007,JPO&INPIT |
