发明名称 |
IMMERSION LITHOGRAPHY SYSTEM HAVING WAFER SEALING MECHANISM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion which can control and surround an immersion lens solution in operating steps of an immersion lithography system. <P>SOLUTION: A solution and seal ring 418 are provided. The solution is an immersion solution for use on a wafer in immersion lithography steps. The seal ring 418 covers the predetermined part of the edge of the wafer. The solution is prevented from being leaked from the covered edge of the wafer when used in the immersion lithography steps. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007142168(A) |
申请公布日期 |
2007.06.07 |
申请号 |
JP20050334210 |
申请日期 |
2005.11.18 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD |
发明人 |
LIN BURN JENG;KO SAISHO;CHEN CHUN-KUANG;LIU RU-GUN;YU SHINN SHENG;SHIH JEN-CHIEH |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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