SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME

摘要

PROBLEM TO BE SOLVED: To solve the problem that defects are caused by an insufficient accuracy and flexure or the like of a mask used at the time of evaporation coating since microfabrication of a pixel region accompanying elevated fineness and enlargement of a substrate accompanying enlargement of a display area are advanced. SOLUTION: By using a photomask or a reticle installed with an auxiliary pattern with a function of light intensity reduction, which consists of diffraction grating pattern or semi-translucent film, a barrier rib having portions with different heights is formed on pixel electrodes (also called first electrodes) in a display region and around a pixel electrode layer. COPYRIGHT: (C)2007,JPO&INPIT