发明名称 PROJECTING APPARATUS AND EXPOSING APPARATUS HAVING THE SAME
摘要 A projection device and an exposure apparatus having the same are provided to prevent a sustaining member from being slant by moving a substrate stage in a vertical direction to adjust a puddle dimension. A projection lens array(352) projects the light emitted from a light source(200) onto a substrate(W). A sustaining member(370) is fixed to a lower end of the projection lens array to guide flow of a fluid between projection lenses of the projection lens array and thus maintain the fluid in a puddle state. A stage supports the substrate and moves the substrate in a vertical direction to adjust a level of the puddle. The sustaining member has a body with a recessed portion and a hole, a supply nozzle supplying a fluid in the recessed portion, a recovery nozzle for discharging the fluid, and an air curtain.
申请公布号 KR20070057348(A) 申请公布日期 2007.06.07
申请号 KR20050116683 申请日期 2005.12.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SEONG, NAK HEE;KIM, ZI GGY;LEE, JU WON
分类号 H01L21/027 主分类号 H01L21/027
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