发明名称 |
PROJECTING APPARATUS AND EXPOSING APPARATUS HAVING THE SAME |
摘要 |
A projection device and an exposure apparatus having the same are provided to prevent a sustaining member from being slant by moving a substrate stage in a vertical direction to adjust a puddle dimension. A projection lens array(352) projects the light emitted from a light source(200) onto a substrate(W). A sustaining member(370) is fixed to a lower end of the projection lens array to guide flow of a fluid between projection lenses of the projection lens array and thus maintain the fluid in a puddle state. A stage supports the substrate and moves the substrate in a vertical direction to adjust a level of the puddle. The sustaining member has a body with a recessed portion and a hole, a supply nozzle supplying a fluid in the recessed portion, a recovery nozzle for discharging the fluid, and an air curtain.
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申请公布号 |
KR20070057348(A) |
申请公布日期 |
2007.06.07 |
申请号 |
KR20050116683 |
申请日期 |
2005.12.02 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SEONG, NAK HEE;KIM, ZI GGY;LEE, JU WON |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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