发明名称 SUBSTRATE PROCESSING EQUIPMENT AND SUBSTRATE PROCESSING METHOD
摘要 <p>Substrate processing equipment (1) is provided with a treatment tank (3) for treating a substrate with a treatment liquid, a dry process part (6) arranged at an upper part of the treatment tank (3), and a transfer mechanism (8) for transferring the substrate (W) between the treatment tank (3) and the dry process part (6). A process gas supplying line (21) for supplying a process gas and inert gas supplying lines (24, 25) for supplying the dry process part (6) with an inert gas are connected to the dry process part (6). A first exhaust line (26) for exhausting an atmosphere pushed out from the dry process part (6) and a second exhaust line (27) for forcibly exhausting the dry process part (6) are connected to the dry process part (6).</p>
申请公布号 KR20070058017(A) 申请公布日期 2007.06.07
申请号 KR20077010946 申请日期 2007.05.14
申请人 TOKYO ELECTRON LIMITED 发明人 TOSHIMA TAKAYUKI;SHINDO NAOKI;YANO HIROSHI;TSURUSAKI KOTARO
分类号 H01L21/304;H01L21/00;H01L21/677 主分类号 H01L21/304
代理机构 代理人
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