发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A method of configuring a transfer of an image of a pattern onto a substrate with a lithographic apparatus is presented. The method includes selecting a plurality of parameters including a pupil filter parameter; calculating an image of the pattern for the selected parameters; calculating a metric that represents a variation of an attribute of the calculated image over a process range; and adjusting the plurality of parameters based on a result of the metric. |
申请公布号 |
EP1793279(A2) |
申请公布日期 |
2007.06.06 |
申请号 |
EP20060256105 |
申请日期 |
2006.11.29 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
CHEN, ALEK CHI-HENG;HANSEN, STEVEN GEORGE |
分类号 |
G03F7/20;G03F1/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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