Substrate placement in immersion lithography

摘要

A method for determining an offset (”) between a center of a substrate (C s ) and a center of a depression (C D ) in a chuck (WT) includes providing a test substrate (W) to the depression (DP), the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.