发明名称 |
Process for forming pattern and method for producing liquid crystal display apparatus |
摘要 |
A process for forming a pattern contains steps of: forming a first mask pattern on a film to be etched on a substrate; forming a first pattern of the film to be etched by using the first mask pattern as a mask; forming a second mask pattern having a plane shape different from that of the first mask pattern by deforming the first mask pattern; and forming a second pattern of the film to be etched different from the first pattern by using the second mask pattern. By applying the process for forming a pattern, for example, to the formation of a semiconductor layer and source and drain electrodes of a TFT substrate of a liquid crystal display apparatus, the above-stated formation requiring two photoresist process steps in a conventional manufacturing method of a liquid crystal display apparatus can be carried out by only one process step, thereby reducing manufacturing cost thereof. |
申请公布号 |
US7226865(B2) |
申请公布日期 |
2007.06.05 |
申请号 |
US20050268811 |
申请日期 |
2005.11.07 |
申请人 |
NEC LCD TECHNOLOGIES, LTD. |
发明人 |
KIDO SHUSAKU |
分类号 |
G02F1/1368;H01L21/302;G02F1/13;G03F7/40;G09F9/30;H01L21/027;H01L21/3065;H01L21/336;H01L21/77;H01L27/12;H01L29/423;H01L29/43;H01L29/49;H01L29/786 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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