METHOD FOR MANUFACTURING A METAL MASK USING MULTILAYER PHOTORESIST FILM AND A METAL MASK USING THE SAME

摘要

Provided are a method for manufacturing a metal mask and a metal mask produced thereby using multi-layered photoresist film, which has excellent accuracy and minute pitch when compared to a metal mask produced by conventional process. The method for manufacturing a metal mask comprises the steps of: applying a multi-layered photoresist film onto a conductive substrate(S200,S210); exposing and developing the multi-layered photoresist film sequently via a photolithography process to perform a patterning(S220,S230); forming a metal layer via electroforming(S240); and separating the metal layer from the conductive substrate. The method further comprises the step of removing contaminants from a surface of the conductive substrate prior to the step of applying a multi-layered photoresist film onto a conductive substrate.