发明名称 Photocurable/therosetting resin composition, photosensitive dry film formed therefrom and method of forming pattern with the same
摘要 A photocurable and thermosetting resin composition comprising (A) a photosensitive prepolymer having a carboxyl group in combination with at least two ethylenically unsaturated double bonds in its molecule, (B) a polymerization initiator, (C) a diluent, (D) an oxetane compound having at least two oxetanyl groups in its molecule, and (E) a curing promotor is developable with an alkaline solution and can be formulated as a one package preparation. Such a photocurable and thermosetting resin composition and a photosensitive dry film prepared by the use thereof are useful as various resist materials and electrical insulating materials, particularly as solder resists for printed circuit boards, interlaminar insulating materials for build-up multi-layer printed circuit boards, and the like.
申请公布号 US7226710(B2) 申请公布日期 2007.06.05
申请号 US20040980190 申请日期 2004.11.04
申请人 TAIYO INK MANUFACTURING CO., LTD. 发明人 NISHIKUBO TADATOMI;KAMEYAMA ATSUSHI;SASAKI MASAKI;KUSAMA MASATOSHI;ONODERA SEIYA
分类号 G03F7/038;C08F2/48;C08G65/18;G03F7/004;H05K3/28;H05K3/46 主分类号 G03F7/038
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