发明名称 System and methods for manufacturing a liquid crystal device
摘要 The invention provides a thin-film forming device, a thin-film forming method, a device for manufacturing a liquid crystal display, a method for manufacturing a liquid crystal display, a device for manufacturing a thin-film structure, a method for a thin-film structure, a liquid crystal display, a thin-film structure, and an electronic apparatus, objects are to achieve easy control of thickness of a thin film without using rotation means, cost reduction, and miniaturization of the devices. The thin-film forming device for forming a thin film by applying a coating solution onto a substrate, there can be provided an ejection mechanism having a droplet ejection head for ejecting the coating solution onto the substrate, a moving mechanism capable of relatively moving the positions of the droplet ejection head and the substrate, and a control unit for controlling at least one of the ejection mechanism and the moving mechanism. As a result, the control unit described above can control the thickness of the thin film by changing the coating conditions of the coating solution L by controlling at least one of an ejection operation by the ejection mechanism and a moving operation by the moving mechanism.
申请公布号 US7226642(B2) 申请公布日期 2007.06.05
申请号 US20030368607 申请日期 2003.02.20
申请人 SEIKO EPSON CORPORATION 发明人 SAKURADA KAZUAKI
分类号 B05B13/04;B05D5/00;H01L21/00;H01L21/31 主分类号 B05B13/04
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