发明名称 |
Plasma processing apparatus |
摘要 |
A plasma processing apparatus includes an evacuatable processing vessel; a workpiece mount base for mounting thereon an object to be processed; a microwave transmitting plate provided in an opening of a ceiling of the processing vessel; a planar antenna member for supplying a microwave into the processing vessel via the microwave transmitting plate; a shield lid grounded to cover a top of the planar antenna member; a waveguide for guiding the microwave to the planar antenna member; a member elevating mechanism for relatively varying a vertical distance between the planar antenna member and the shield lid; a tuning rod insertable into the waveguide; a tuning rod driving mechanism for moving the tuning rod to adjust an insert amount thereof; and a matching control section for controlling an elevation amount of the planar antenna member and the insert amount of the tuning rod to obtain a matching adjustment.
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申请公布号 |
US7226524(B2) |
申请公布日期 |
2007.06.05 |
申请号 |
US20040498672 |
申请日期 |
2004.06.14 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KASAI SHIGERU;YAMAMOTO NOBUHIKO;ADACHI HIKARU;OSADA YUKI |
分类号 |
C23C16/00;H05H1/46;C23C16/511;C23F1/00;H01J37/32;H01L21/205;H01L21/306;H01P5/103 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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