发明名称 High quality antialiased lines with dual sampling pattern
摘要 Antialiased lines are classified according to their orientation, e.g. as x-major or y-major depending whether the x or y extent of the line is larger. Different subpixel sampling patterns are used for different lines, in accordance with this classification. This permits antialiased rendering to achieve increased visual quality of the line without adding in more sample points.
申请公布号 US7227556(B2) 申请公布日期 2007.06.05
申请号 US20020086986 申请日期 2002.03.01
申请人 O'DRISCOLL GERARD 发明人 O'DRISCOLL GERARD
分类号 G09G5/00;G06T11/20 主分类号 G09G5/00
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